About this product

Product Identifiers

PublisherElsevier Science & Technology Books

ISBN-100127282513

ISBN-139780127282510

eBay Product ID (ePID)32141

Product Key Features

Number of Pages888 Pages

Publication NameThin Film Processes

LanguageEnglish

SubjectMaterials Science / Thin Films, Surfaces & Interfaces, Physics / General

Publication Year1991

TypeTextbook

AuthorWerner Kern

Subject AreaTechnology & Engineering, Science

FormatHardcover

Dimensions

Item Weight48 Oz

Item Length9 in

Item Width6 in

Additional Product Features

Intended AudienceScholarly & Professional

LCCN90-020758

ReviewsThe editors are to be commended for producing an excellent text that should prove to be as popular as their first volume published over 20 years ago.--George H. Sigel, Jr. in OPTICS & PHOTONICS NEWSThe book is a welcome addition to the growing library of edited books on deposition processes.--SOCIETY OF VACUUM COATERSThis book does a good job of examining film deposition and etching from the process viewpoint. Explanations of basic processes and their various parameters are clearly presented, and the reader is left with a feeling of what is and is not well understood about each process. This approach, coupled with extensive references to the general literature, should make this book valuable to both beginning and advanced reseachers in the field....In short, this book should be a worthy addition to the library of anyone working in the field of thin films.--APPLIED OPTICSThe book will be welcomed by those who may wish to gain a broad perspective on a particular process or the techniques generally available, as well as by the specialist using such processes....The book provides an interesting juxtaposition of relatively well established procedures with quite recent and still developing techniques; it will certainly be a useful book to have around.--VACUUMAs a status report of technology in the preparation of electronic materials, it can serve both as a reference for those within the field and an introduction to those with related interest.--JOURNAL OF METALSFor those currently in the field of thin film research, this book would be an excellent appraisal and current reference tome. For the entering scientist, it would be a good source book and a quick study for present research.--JOURNAL OF THE ELECTROCHEMICAL SOCIETYThis book is a valuable addition to the library of the physicist, chemist, or engineer who desires to broaden his knowledge of coating processes.--THE AUSTRALIAN PHYSICIST

Dewey Edition20

IllustratedYes

Dewey Decimal621.381/52

Table Of ContentJ.L. Vossen and W. Kern, Introduction. S.M. Rossnagel, Glow Discharge Plasma and Sources for Etching and Deposition. C.V. Deshpandey and R.F. Bunshah, Evaporation Processes. P.P. Chow, Molecular Beam Epitaxy. R. Parsons, Sputter Deposition Processes. P.C. Johnson, The Cathodic Arc Plasma Deposition of Thin Films. K.F. Jensen and W. Kern, Thermal Chemical Vapor Deposition. K.F. Jensen and T. Kuech, Metal-Organic Chemical Vapor Deposition. J.G. Eden, Photochemical Vapor Deposition. L.C. Klein, Sol-Gel Coatings. R. Reif and W. Kern, Plasma-Enhanced Chemical Vapor Deposition. G. Lucovsky, D.V. Tsu, R.A. Rudder, and R.J. Markunas, Formation of Inorganic Films by Remote Plasma-Enhanced Chemical-Vapor Deposition. T.M. Mayer and S.D. Allen, Selected Area Processing. H.W. Lehman, Plasma-Assisted Etching. P.R. Puckett, S.L. Michel, and W.E. Hughes, Ion Beam Etching. C.I.H. Ashby, Laser-Driven Etching.

SynopsisThis sequel to an earlier work offers an exposition of important thin film deposition and etching processes. It is intended to be of use to both the beginner in any particular process and to the experienced user wishing a wider perspective. Information is presented in a tutorial format. New topics which have arisen since the first book are included and some topics from the first book are updated. The practical applications of major thin film deposition and etching processes are given special emphasis.

LC Classification NumberTK7871.15.F5T432